Single crystal furnace
US11795570B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 18, 2020 |
| Grant date | Oct 24, 2023 |
| Priority date | — |
| Expiry date | Mar 17, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A single crystal furnace is provided, including a main furnace chamber; an auxiliary furnace chamber communicating with the main furnace chamber; and a material chamber provided with a charging inlet and a charging mechanism, wherein the material chamber is communicated with the main furnace chamber through the charging inlet, the charging mechanism is telescopically coupled to the charging inlet for charging materials into a crucible in the main furnace chamber. In the single crystal furnace, the material chamber is provided, so that charging operation may be performed during taking out the monocrystalline silicon rod, thereby effectively shortening the time consumed by taking out the monocrystalline silicon rod and the charging operation, and improving production efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.