Scene layout estimation
US11797724B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 8, 2021 |
| Grant date | Oct 24, 2023 |
| Priority date | — |
| Expiry date | Mar 10, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2210/12
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Systems and techniques are provided for determining environmental layouts. For example, based on one or more images of an environment and depth information associated with the one or more images, a set of candidate layouts and a set of candidate objects corresponding to the environment can be detected. The set of candidate layouts and set of candidate objects can be organized as a structured tree. For instance, a structured tree can be generated including nodes corresponding to the set of candidate layouts and the set of candidate objects. A combination of objects and layouts can be selected in the structured tree (e.g., based on a search of the structured tree, such as using a Monte-Carlo Tree Search (MCTS) algorithm or adapted MCTS algorithm). A three-dimensional (3D) layout of the environment can be determined based on the combination of objects and layouts in the structured tree.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.