Patent · US Active

Sealable devices to cause deposition of vapors into samples

US11802091B2 · kind B2 · utility

0Cited by

11References

15Claims

0Family size

Assignee

The Government of the United States of America, as represented by the Secretary of Homeland Security · US

Inventor

Inho Cho · Yongin-si, KR

Key dates

Filing date	Oct 21, 2022
Grant date	Oct 31, 2023
Priority date	—
Expiry date	Oct 21, 2042

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC04B2111/542
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

Various embodiments of the present invention are directed towards a system and method relating to depositing vapor in a sample. For example, a device includes a vapor source chamber configured to contain a vapor source material to generate vapor. An activation chamber is configured to contain a sample. The activation chamber is in fluid communication with the vapor source chamber to receive the vapor. A permeable separator divides the vapor source chamber and the activation chamber, and isolates the sample in the activation chamber while allowing vapor to pass between the vapor source chamber and the activation chamber. The device is sealable and configured to apply vacuum to the vapor and sample, to cause deposition of the vapor into the pumice stone samples.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.