Graphene-enabled block copolymer lithography transfer to arbitrary surfaces

US11803120B2 · kind B2 · utility

Assignee

• The Government of the United States of America, as represented by the Secretary of the Navy · US

Inventors

• Keith E. Whitener · Alexandria, US
• Woo K. Lee · Hwaseong-si, KR

Key dates

• Filing date: Dec 8, 2020
• Grant date: Oct 31, 2023
• Expiry date: Oct 21, 2041

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/343
• WIPO field: Other special machines
• WIPO sector: Mechanical engineering

Abstract

A method of graphene-enabled block copolymer lithography transfer to an arbitrary substrate comprising the steps of applying graphene on a surface, adding block copolymers to the graphene on the surface, phase-separating the block copolymers, forming nanopatterned phase separated block copolymers, delaminating the graphene, and transferring the graphene and nanopatterned phase separated block copolymers to a second surface. A layer of nanopatterned phase separated block copolymers on an arbitrary surface comprising a first arbitrary substrate absent of chemical preparation, a layer of graphene on the first arbitrary substrate, and a layer of phase-separated block copolymers on the layer of graphene, wherein the layer of phase-separated block copolymers on the layer of graphene was formed on a second substrate and delaminated via water liftoff and wherein the nanopatterned phase separated block copolymers are utilized as a shadow mask for lithography on the first arbitrary substrate.