Dislocation glide suppression for misfit dislocation free heteroepitaxy
US11804525B2 · kind B2 · utility
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2References
17Claims
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Key dates
| Filing date | Oct 9, 2020 |
| Grant date | Oct 31, 2023 |
| Priority date | — |
| Expiry date | Oct 9, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S2301/173
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An epitaxial structure includes a semiconductor substrate, a dislocation blocking layer; and one or more active layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.