Silicon and silica nanostructures and method of making silicon and silica nanostructures
US11807571B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 8, 2021 |
| Grant date | Nov 7, 2023 |
| Priority date | — |
| Expiry date | Dec 8, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2004/13
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided herein are methods for forming one or more silicon nanostructures, such as silicon nanotubes, and a silica-containing glass substrate. As a result of the process used to prepare the silicon nanostructures, the silica-containing glass substrate comprises one or more nanopillars and the one or more silicon nanostructures extend from the nanopillars of the silica-containing glass substrate. The silicon nanostructures include nanotubes and optionally nanowires. A further aspect is a method for preparing silicon nanostructures on a silica-containing glass substrate. The method includes providing one or more metal nanoparticles on a silica-containing glass substrate and then performing reactive ion etching of the silica-containing glass substrate under conditions that are suitable for the formation of one or more silicon nanostructures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.