Mask and method for manufacturing mask
US11807932B2 · kind B2 · utility
0Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2021 |
| Grant date | Nov 7, 2023 |
| Priority date | — |
| Expiry date | Mar 10, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for manufacturing a mask includes providing, on a stage, a mask frame in which a plurality of cell openings is defined; providing each of the cell openings with a cell mask material in which a second area and a plurality of first areas are defined, where the second area is disposed around each of the first areas; emitting a laser beam to the second area to harden the second area; and removing the first areas, thereby forming a plurality of cell masks disposed in the cell openings, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.