Integrated vapor chamber and manufacturing method thereof
US11815314B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 13, 2022 |
| Grant date | Nov 14, 2023 |
| Priority date | — |
| Expiry date | Feb 21, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23P2700/09
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An integrated vapor chamber includes an outer shell and a plurality of composite capillary structures. The outer shell includes a flat casing and a plurality of partitions integrally formed. The flat shell includes a chamber, and the partitions are disposed in the chamber to separate the chamber into a plurality of flow channels. Each composite capillary structure is extended along each flow channel and distributed in the chamber. The composite capillary structure includes a metal mesh and a plurality of sintered powder uniformly sintered in the metal mesh. Furthermore, this disclosure also discloses a manufacturing method of the integrated vapor chamber. Therefore, the manufacturing method of the thin vapor chamber is simplified to improve the yield rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.