Method for preparing a substrate by applying a sample to be analysed
US11815440B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 1, 2017 |
| Grant date | Nov 14, 2023 |
| Priority date | — |
| Expiry date | Nov 5, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2035/00495
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention relates to a method for preparing a substrate (105a) comprising a sample reception area (110) and a sensing area (111). The method comprises the steps of: 1) applying a sample on the sample reception area; 2) rotating the substrate around a predetermined axis; 3) during rotation, at least part of the liquid travels from the sample reception area to the sensing area due to capillary forces acting between the liquid and the substrate; and 4) removing the wave of particles and liquid formed at one end of the substrate. The sensing area is closer to the predetermined axis than the sample reception area. The sample comprises a liquid part and particles suspended therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.