Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same
US11815800B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2021 |
| Grant date | Nov 14, 2023 |
| Priority date | — |
| Expiry date | Dec 9, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition includes a plurality of quantum dots including an organic ligand on the surface thereof; a binder; a photopolymerizable monomer composition; photoinitiator; and a solvent, wherein the photopolymerizable monomer includes a main monomer having 1 to 6 carbon-carbon double bonds, a first accessory monomer having 8 to 20 carbon-carbon double bonds, and a second accessory monomer represented by Chemical Formula A; and a method of preparing the photosensitive composition and a quantum dot-polymer composite pattern prepared therefrom are provided: R1O-(L1)m-L3-A-L4-(L2)n-OR2 Chemical Formula A wherein, A, L1, L2, L3, L4, R1, and R2 are the same as defined herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.