Patent · US Active

Field facet system, optical arrangement and lithography apparatus

US11815817B2 · kind B2 · utility

0Cited by

0References

25Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Guenter Rudolph · Jena, DE
Joram Rosseels · Putte, BE

Key dates

Filing date	Dec 16, 2021
Grant date	Nov 14, 2023
Priority date	—
Expiry date	Dec 16, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/10
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A field facet system for a lithography apparatus includes an optical element. The optical element includes a base section having an optically effective surface. The optical element also includes a plurality of lever sections provided at a rear side of the base section facing away from the optically effective surface. In addition, the field facet system includes two or more actuating elements configured, with the aid of the lever sections acting as levers, to apply in each case a bending moment to the base section to elastically deform the base section and thus to alter a radius of curvature of the optically effective surface. The actuating elements are arranged in series as viewed along a length direction of the optical element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.