Apparatus for removing residue of EUV light source vessel
US11822260B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 7, 2022 |
| Grant date | Nov 21, 2023 |
| Priority date | — |
| Expiry date | Sep 7, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for removing a residue of an EUV light source vessel including an internal side surface having a curved surface is provided. The apparatus includes a frame portion configured to be disposed on a bottom surface of an EUV light source vessel and a head portion above the frame portion. The head portion is configured to be rotatably moved on a circular trajectory while maintaining a desired (and/or alternatively predetermined) distance from the curved surface of the EUV light source vessel. The head portion may have a heating member configured to emit heat toward the curved surface of the EUV light source vessel. The heating member may have a shape curved in an arc corresponding to a portion of the circular trajectory.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.