Method for manufacturing piezoelectric bulk layers with tilted c-axis orientation
US11824511B2 · kind B2 · utility
1Cited by
27References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2019 |
| Grant date | Nov 21, 2023 |
| Priority date | — |
| Expiry date | Feb 2, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N30/708
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods for depositing bulk layer crystalline material having a predetermined c-axis tilt on a substrate include a first step of depositing a first portion of bulk layer material at a first incidence angle to achieve a predetermined c-axis tilt, and a second step of depositing a second portion of the bulk material layer onto the first portion at a second incidence angle that is smaller than the first incidence angle. The second portion has a second c-axis tilt that substantially aligns with the first c-axis tilt.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.