Sputtering target
US11827971B2 · kind B2 · utility
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0References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 17, 2019 |
| Grant date | Nov 28, 2023 |
| Priority date | — |
| Expiry date | Jul 17, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/26
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The present invention provides a sputtering target which has low risk to the human body, and which is able to be suppressed in the occurrence of a crack even in cases where sputtering is carried out at a high output power for a long period of time.A sputtering target contains Zn as a main component, contains specific metals including Zr in specific compositions, and contains a complex oxide of Zr.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.