High efficiency rotatable sputter target
US11830712B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Apr 24, 2020 |
| Grant date | Nov 28, 2023 |
| Priority date | — |
| Expiry date | Jul 29, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A rotatable sputtering target is provided for use in a sputtering system having a plurality of hollow sleeves of sputtering material arranged on a hollow e backing tube so as to form an annular space that is occupied by a bonding agent and a thermally conductive element which is a woven metal mesh.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.