Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern
US11834419B2 · kind B2 · utility
0Cited by
9References
16Claims
0Family size
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Key dates
| Filing date | Oct 11, 2019 |
| Grant date | Dec 5, 2023 |
| Priority date | — |
| Expiry date | Aug 17, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A compound represented by Chemical Formula 1, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.