Patent · US Active

Microarray fabrication system and method

US11834704B2 · kind B2 · utility

0Cited by

96References

18Claims

0Family size

Assignee

Illumina, Inc. · US

Inventors

M. Shane Bowen · Encinitas, US
Kevin L. Gunderson · San Diego, US
Shengrong Lin · Hayward, US
Maria Candelaria Rogert Bacigalupo · Encinitas, US
Kandaswamy Vijayan · San Diego, US
Yir-Shyuan Wu · Fremont, US
Bala Murali Venkatesan · Champaign, US
James Tsay · Los Angeles, US
John M. Beierle · Laguna Niguel, US
Lorenzo Berti · San Diego, US
Sang Ryul Park · San Diego, US

Key dates

Filing date	Dec 7, 2020
Grant date	Dec 5, 2023
Priority date	—
Expiry date	Aug 31, 2041

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC40B40/06
WIPO fieldOrganic fine chemistry
WIPO sectorChemistry

Abstract

A method includes forming a patterned substrate including a plurality of base pads, using a nano-imprint lithography process. A capture substance is attached to each of the plurality of base pads, optionally through a linker, the capture substance being adapted to promote capture of a target molecule.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.