Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
US11835849B2 · kind B2 · utility
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4References
25Claims
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Key dates
| Filing date | Feb 14, 2023 |
| Grant date | Dec 5, 2023 |
| Priority date | — |
| Expiry date | Feb 14, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A),
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.