Exposure apparatus, exposure method, and article manufacturing method
US11841614B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2021 |
| Grant date | Dec 12, 2023 |
| Priority date | — |
| Expiry date | Jun 27, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70575
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus configured to expose a substrate to light from a solid-state light emitting element, includes an illumination optical system configured to illuminate a mask with the light, and a projection optical system configured to project an image of a pattern of the mask onto the substrate, wherein a pupil plane intensity distribution, which is a light intensity distribution on a pupil plane included in the illumination optical system and optically conjugated with a light emission plane of the solid-state light emitting element, is a light intensity distribution in which a maximum intensity is achieved outside an optical axis of the illumination optical system, and wherein the pupil plane intensity distribution is a light intensity distribution on the pupil plane onto which a light emission distribution of the light emission plane is projected with a predetermined magnification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.