Mask and method for manufacturing the same, exposure system, method for manufacturing a display substrate, and display device
US11841615B2 · kind B2 · utility
1Cited by
2References
18Claims
0Family size
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Key dates
| Filing date | May 26, 2020 |
| Grant date | Dec 12, 2023 |
| Priority date | — |
| Expiry date | Jun 29, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask includes a first light-transmitting portion. The first light-transmitting portion includes a target region and at least one compensation region connected to the target region. A planar pattern of the target region includes a plurality of corners, and a planar pattern of each compensation region extends from one of the plurality of corners. An area of the planar pattern of each compensation region is less than an area of the planar pattern of the target region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.