Chemical vapor deposition apparatus and method of manufacturing display apparatus using the same
US11842883B2 · kind B2 · utility
0Cited by
4References
10Claims
0Family size
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Key dates
| Filing date | Apr 11, 2022 |
| Grant date | Dec 12, 2023 |
| Priority date | — |
| Expiry date | Apr 11, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/164
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.