Method for integrally forming graphene film (GF) of high specific surface area (SSA) by ultrafast ultraviolet (UV) laser processing
US11845663B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 25, 2022 |
| Grant date | Dec 19, 2023 |
| Priority date | — |
| Expiry date | Dec 25, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2004/04
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for integrally forming a graphene film (GF) of a high specific surface area (SSA) by ultrafast ultraviolet (UV) laser processing, includes: selecting a carbon precursor material, where the carbon precursor material is one selected from the group consisting of a biomass/hydrogel composite and a heavy hydrocarbon compound; adding an activator solution to an inside of the carbon precursor material to obtain a composite with an activator uniformly loaded, and spreading the composite on a flexible substrate to form a carbon precursor material layer; heating and drying the carbon precursor material layer; in-situ processing with an ultrafast UV laser to obtain an activated GF of a high SSA; and cleaning and drying the activated GF. With the method of the present disclosure, a microporous activated GF of a high SSA can be directly processed in-situ on a flexible substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.