Method for producing chlorosilanes
US11845667B2 · kind B2 · utility
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19Claims
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Key dates
| Filing date | Apr 18, 2018 |
| Grant date | Dec 19, 2023 |
| Priority date | — |
| Expiry date | Feb 27, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/06
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Chlorosilanes of the general formula HnSiCl4-n and/or HmCl6-mSi2, where n=1-4 and m=0-4, are produced in a fluidized bed reactor by reaction of a hydrogen chloride-containing reaction gas with a silicon contact mass granulation mixture composed of a coarse grain fraction and a fine grain fraction, wherein the average particle size of the fine grain fraction d50,fine is smaller than the average particle size of the coarse grain fraction d50,coarse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.