Patent · US Active

Method for producing chlorosilanes

US11845667B2 · kind B2 · utility

0Cited by
3References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 18, 2018
Grant dateDec 19, 2023
Priority date
Expiry dateFeb 27, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B29/06
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Chlorosilanes of the general formula HnSiCl4-n and/or HmCl6-mSi2, where n=1-4 and m=0-4, are produced in a fluidized bed reactor by reaction of a hydrogen chloride-containing reaction gas with a silicon contact mass granulation mixture composed of a coarse grain fraction and a fine grain fraction, wherein the average particle size of the fine grain fraction d50,fine is smaller than the average particle size of the coarse grain fraction d50,coarse.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.