Diffraction device and method for non-destructive testing of internal crystal orientation uniformity of workpiece
US11846595B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2019 |
| Grant date | Dec 19, 2023 |
| Priority date | — |
| Expiry date | Sep 14, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/605
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A diffraction apparatus and a method for non-destructively testing internal crystal orientation uniformity of a workpiece are provided. The apparatus includes: an X-ray irradiation system for irradiating an X-ray to a measured part of a sample under testing, and an X-ray detection system for simultaneously detecting a plurality of diffracted X-rays formed by diffraction of a plurality of parts of the sample under testing, to measure an X-ray diffraction intensity distribution of the sample under testing, where the detected diffracted X-rays are short-wavelength characteristic X-rays, and the X-ray detection system is an array detection system. By the apparatus and the method, the detection efficiency is greatly improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.