Patent · US Active

Characterization of a venting state or other system parameter that affects the characterization of a force applied to a device

US11847311B2 · kind B2 · utility

0Cited by
49References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 13, 2020
Grant dateDec 19, 2023
Priority date
Expiry dateNov 3, 2040

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F2203/04105
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

An electronic device includes a pressure sensor and a processor. The pressure sensor is disposed within an interior volume of the electronic device and configured to generate a time-dependent sequence of measurements related to a force applied to the electronic device. The processor is configured to characterize, using at least the time-dependent sequence of measurements, a venting state of the interior volume. In some embodiments, the electronic device may also include a capacitive force sensor disposed to detect distortion of the interior volume. A second time-dependent sequence of measurements related to the force may be generated by the capacitive force sensor, and used by the processor to characterize the venting state of the interior volume.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.