System for a semiconductor fabrication facility and method for operating the same
US11848222B2 · kind B2 · utility
0Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2020 |
| Grant date | Dec 19, 2023 |
| Priority date | — |
| Expiry date | May 27, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67733
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A system for a semiconductor fabrication facility (FAB) includes an orientation tool and a transporting tool configured to transport at least one customized part. The orientation tool includes a port configured to receive the workpiece, a sensor configured to detect an orientation of the workpiece received in the port and a rotation mechanism configured to turn the workpiece received in the port.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.