Patent · US Active

Low dielectric, low loss radomes

US11848491B2 · kind B2 · utility

0Cited by

5References

20Claims

0Family size

Assignee

Laird Technologies, Inc. · US

Inventors

Hoang Dinh DO · Canton, US
Richard N. Johnson · Adelphi, US
Douglas S. McBain · Wadsworth, US

Key dates

Filing date	Sep 30, 2021
Grant date	Dec 19, 2023
Priority date	—
Expiry date	Aug 26, 2042

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB32B2457/00
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A low dielectric, low loss radome comprising microspheres integrated into a matrix. The microspheres reduce overall dielectric constant, whereby the radome has a dielectric constant less than 2.5 through a thickness of the radome.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.