Patent · US Active

Etchant composition, tackifier, alkaline solution, method of removing polyimide and etching process

US11851597B2 · kind B2 · utility

0Cited by

4References

14Claims

0Family size

Assignee

eChem Solutions Corp. · TW

Inventors

Yu Chen · Brookline, US
Ming-Che Chung · Taoyuan, TW

Key dates

Filing date	Apr 27, 2021
Grant date	Dec 26, 2023
Priority date	—
Expiry date	Apr 27, 2041

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08J2379/08
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

An etchant composition, a tackifier, an alkaline solution, a method of removing polyimide and an etching process are provided. The etchant composition includes a tackifier (A) and an alkaline solution (B). The tackifier (A) includes a resin containing a hydroxyl group (a), a surfactant (b) and a first solvent (c1). The alkaline solution (B) includes an alkaline compound (d) and a second solvent (c2).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.