Debanding using a novel banding metric
US11854165B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2020 |
| Grant date | Dec 26, 2023 |
| Priority date | — |
| Expiry date | Aug 8, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/20084
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method includes training a first model to measure the banding artefacts, training a second model to deband the image, and generating a debanded image for the image using the second model. Training the first model can include selecting a first set of first training images, generating a banding edge map for a first training image, where the map includes weights that emphasize banding edges and de-emphasize true edges in the first training image, and using the map and a luminance plane of the first training image as input to the first model. Training the second model can include selecting a second set of second training images, generating a debanded training image for a second training image, generating a banding score for the debanded training image using the first model, and using the banding score in a loss function used in training the second model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.