Patent · US Active

Antipathogenic face mask

US11857001B2 · kind B2 · utility

0Cited by

5References

10Claims

0Family size

Assignee

SINTX Technologies, Inc. · US

Inventors

Bryan J. McEntire · Sandy, US
Ryan M. Bock · Salt Lake City, US
Bhajanjit Singh Bal · Salt Lake City, US

Key dates

Filing date	Apr 14, 2021
Grant date	Jan 2, 2024
Priority date	—
Expiry date	Apr 14, 2041

Classification

Technology area (CPC D)Textiles; Paper
CPC primaryD10B2501/04
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 1 wt. % to about 15 wt. %.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.