System and method for fabricating polarization holograms
US11860573B1 · kind B1 · utility
1Cited by
1References
19Claims
0Family size
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Key dates
| Filing date | Apr 13, 2021 |
| Grant date | Jan 2, 2024 |
| Priority date | — |
| Expiry date | Sep 14, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2240/15
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system includes a mask configured to forwardly diffract an input beam as a first set of two polarized beams. The system also includes a polarization conversion element configured to convert the first set of two polarized beams into a second set of two polarized beams having opposite handednesses. The two polarized beams having opposite handednesses interfere with one another to generate a polarization interference pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.