Cleaning device
US11864696B2 · kind B2 · utility
0Cited by
6References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 19, 2021 |
| Grant date | Jan 9, 2024 |
| Priority date | — |
| Expiry date | Feb 19, 2041 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA47L13/22
- WIPO fieldFurniture, games
- WIPO sectorOther fields
Abstract
A cleaning device comprises a surface interaction layer (ML), a cleaning fluid supply (CFF) provided with a cleaning fluid channel (CFC) at the surface interaction layer (ML) for supplying a cleaning fluid to a surface (F) through the surface interaction layer (ML) being in contact with the surface (F), and a dirty fluid drain (DFD) having a dirty fluid channel (DFC) at the surface interaction layer (ML) for draining, by means of underpressure, dirty water from the surface (F) through the surface interaction layer (ML) being in contact with the surface (F).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.