Patent · US Active

Silica particle and method for producing the same

US11866340B2 · kind B2 · utility

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12Claims
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Key dates

Filing dateAug 19, 2020
Grant dateJan 9, 2024
Priority date
Expiry dateDec 1, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2006/17
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A silica particle includes: a quaternary ammonium salt, in which the following expressions are satisfied, 0.90≤FBEFORE/FAFTER≤1.10, and 5≤FSINTERING/FBEFORE≤20, in which FBEFORE represents a maximum frequency value of a pore diameter of 2 nm or less in the silica particles before washing, which is obtained from a pore distribution curve in a nitrogen gas adsorption method, FAFTER represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles after washing, which is obtained from the pore distribution curve in the nitrogen gas adsorption method, and FSINTERING represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles before washing and after sintering at 600° C., which is obtained from the pore distribution curve in the nitrogen gas adsorption method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.