Non-uniform circular motion for electroplating barrels and methods of use
US11866840B2 · kind B2 · utility
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6References
12Claims
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Key dates
| Filing date | Feb 19, 2020 |
| Grant date | Jan 9, 2024 |
| Priority date | — |
| Expiry date | Dec 18, 2040 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16H1/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided herein are systems, methods and apparatuses for Non-Uniform Circular Motion for Electroplating Barrels and methods of use. Various system, parts, and parameters are used to maintain Non-Uniform Circular Motion for Electroplating Barrels for uniformity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.