Master stamp for nano imprint and method for manufacturing the same
US11868042B2 · kind B2 · utility
0Cited by
14References
16Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 8, 2019 |
| Grant date | Jan 9, 2024 |
| Priority date | — |
| Expiry date | Mar 3, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133548
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A stamp for nano imprinting includes a base substrate, a first pattern part and a second pattern part disposed on the base substrate and having different widths, and a third pattern part and a fourth pattern part having different widths. Each of the first pattern part to the fourth pattern part includes a plurality of nano patterns, and the first pattern part and the second pattern part and the third pattern part and the fourth pattern are disposed to be arranged adjacent to each other in a sequential order in the first direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.