Plasma scalpel for selective removal of microbes and microbial biofilms
US11871978B2 · kind B2 · utility
0Cited by
10References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2018 |
| Grant date | Jan 16, 2024 |
| Priority date | — |
| Expiry date | Apr 25, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/34
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The disclosure relates to the medical device field. In particular, the disclosure relates to a dynamically controlled plasma scalpel in combination with an imaging system to selectively remove biofilm while minimizing damage to healthy tissue. Systems and apparatuses according to the disclosure include: (1) dynamically controlled plasma scalpel, (2) biofilm imaging system, (3) computer control system, (4) three-dimensional scalpel positioning stage, and (5) biofilm detritus removal system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.