Photobase generator, compound, photoreactive composition, and reaction product
US11873354B2 · kind B2 · utility
0Cited by
3References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 10, 2020 |
| Grant date | Jan 16, 2024 |
| Priority date | — |
| Expiry date | Mar 11, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/00
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A photobase generator includes a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and the pKa of a conjugate acid of the base in water is 12 or more. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.