Wavefront sensor and method of reconstructing distorted wavefronts
US11874178B2 · kind B2 · utility
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3References
15Claims
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Key dates
| Filing date | Jun 22, 2021 |
| Grant date | Jan 16, 2024 |
| Priority date | — |
| Expiry date | Jan 6, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2009/002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A wavefront sensor includes a mask and a sensor utilized to capture a diffraction pattern generated by light incident to the mask. A reference image is captured in response to a plane wavefront incident on the mask, and another measurement image is captured in response to a distorted wavefront incident on the mask. The distorted wavefront is reconstructed based on differences between the reference image and the measurement image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.