Patterned film, variable-transmittance device comprising same, and method for producing variable-transmittance device
US11874564B2 · kind B2 · utility
0Cited by
7References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 4, 2021 |
| Grant date | Jan 16, 2024 |
| Priority date | — |
| Expiry date | May 10, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/28
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern film, a transmittance variable device comprising the same, and a method for manufacturing a transmittance variable device are disclosed herein. In some embodiments, a pattern film includes a first base layer, and a spacer pattern formed on the first base layer, wherein the spacer pattern comprises a partition wall spacer and a ball spacer, wherein the ball spacer is one of embedded in, partially embedded in, or in contact with the partition wall spacer, and wherein an area of the spacer pattern per unit area of the first base layer is 5% or greater to 17% or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.