Fast and deep facial deformations
US11875458B2 · kind B2 · utility
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3References
17Claims
0Family size
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Key dates
| Filing date | Apr 29, 2022 |
| Grant date | Jan 16, 2024 |
| Priority date | — |
| Expiry date | Apr 29, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2219/2021
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
According to at least one embodiment, a method for generating a mesh deformation of a facial model includes: generating a first plurality of deformation maps by applying a first plurality of neural network-trained models; extracting a first plurality of vertex offsets based on the first plurality of deformation maps; and applying the first plurality of vertex offsets to a neutral mesh of the facial model to generate the mesh deformation of the facial model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.