Patent · US Active

Feedback system

US11875979B2 · kind B2 · utility

0Cited by
0References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 17, 2018
Grant dateJan 16, 2024
Priority date
Expiry dateFeb 2, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L22/26
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A feedback system for controlling properties of a single layer or multiple layer stack is applied on a substrate by means of a vacuum coating process controlled by a plurality of process controlling means. The system includes at least one monitoring device for at least implementing at least two distinct measurement techniques for determining measurement signals at each of a plurality of locations spatially distributed over the coated substrate; at least one processing unit adapted for at least receiving the measurement signals; and a controller for at least providing actuation signals for actuating the plurality of process controlling means.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.