Patent · US Active

Organic semiconductor substrate

US11882733B2 · kind B2 · utility

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1References
9Claims
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Key dates

Filing dateJul 1, 2021
Grant dateJan 23, 2024
Priority date
Expiry dateJan 5, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K59/131

Abstract

An organic semiconductor substrate includes a base, a first conductive pattern, a second conductive pattern, a first metal oxide pattern, a second metal oxide pattern, an organic flat pattern layer, a source, a drain, an organic semiconductor pattern, an organic gate insulating layer, and a gate. The first conductive pattern and the second conductive pattern are disposed on the base and separated from each other. The first metal oxide pattern and the second metal oxide pattern respectively cover and are electrically connected to the first conductive pattern and the second conductive pattern, respectively. A first portion of the organic flat pattern layer is disposed between the first metal oxide pattern and the second metal oxide pattern. A surface of the first metal oxide pattern has a first distance from the base. A surface of the first portion of the organic flat pattern layer has a second distance from the base. The second distance is less than or equal to the first distance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.