Patent · US Active

Precipitated silica and process for its manufacture

US11884551B2 · kind B2 · utility

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27Claims
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Key dates

Filing dateMay 3, 2018
Grant dateJan 30, 2024
Priority date
Expiry dateMay 3, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08K2201/006
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A precipitated silica having a broad particle size distribution and large median particle size as well as its method of manufacture is provided. The precipitated silica has a CTAB surface area SCTAB in the range from 40 to 300 m2/g, a difference between BET surface area SBET and CTAB surface area SCTAB of at least 35 m2/g, a width of the particle size distribution Ld, measured by centrifugal sedimentation, of at least 1.5, an amount of aluminium WA1 in the range from 0.5 to 7.0 wt %, and a median particle size d50, measured by centrifugal sedimentation, such that for a given value of CTAB surface area SCTAB and amount of aluminium WAl, parameter A, defined by the following equation: A=|d50|+0.782×|SCTAB|−8.524×|WAl|.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.