Patent · US Active

Antiwear system for improved copper corrosion

US11884892B1 · kind B1 · utility

0Cited by
47References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 31, 2023
Grant dateJan 30, 2024
Priority date
Expiry dateMar 31, 2043

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC10N2070/00
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

An organometallic phosphorus-providing antiwear additive and a lubricating composition including the organometallic phosphorus-providing antiwear additive having improved copper corrosion performance obtained by reacting an organic hydroxy compound with phosphorus pentasulfide to form a reaction product, distilling the reaction product and recovering a condensate, and neutralizing the condensate with a basic or neutral metal compound including one or more of a metal oxide, a metal hydroxide, or a metal carbonate to form the organometallic phosphorus-providing antiwear additive or salt thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.