Mask and manufacturing method therefor, and manufacturing method for display substrate
US11885005B2 · kind B2 · utility
1Cited by
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14Claims
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Key dates
| Filing date | Oct 16, 2019 |
| Grant date | Jan 30, 2024 |
| Priority date | — |
| Expiry date | Sep 5, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A mask, a manufacturing method therefor, and a manufacturing method for a display substrate are provided. The mask includes: a first clamping region and a second clamping region, which are opposite to each other in a first direction, and at least one mesh region between the first clamping region and the second clamping region, the mesh region is in a first shape, in a case where the mask is stretched in the first direction, the mesh region is in a target shape, the target shape is different from the first shape, and the target shape includes a polygon shape, a circle shape, or an ellipse shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.