Low-loss metasurface optics for deep UV
US11885979B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 29, 2020 |
| Grant date | Jan 30, 2024 |
| Priority date | — |
| Expiry date | May 19, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/118
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
High-performance optical-metasurface-based components configured to at frequencies of UV light and, in particular, in deep UV range and performing multiple optical-wavefront-shaping functions (among which there are high-numerical-aperture lensing, accelerating beam generation, and hologram projection). As a representative material for such components, hafnium oxide demands creation and establishment of a novel process of manufacture that is nevertheless based on general principles of Damascene lithography, to be compatible with existing technology and yet sufficient for producing high-aspect-ratio features that currently-used materials and processes simply do not deliver. The described invention opens a way towards low-form-factor, multifunctional ultraviolet nanophotonic platforms based on flat optical components and enabling diverse applications including lithography, imaging, spectroscopy, and quantum information processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.