Resilient writing device
US11886061B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 3, 2022 |
| Grant date | Jan 30, 2024 |
| Priority date | — |
| Expiry date | Jan 3, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A writing device includes a liquid crystal layer including cholesteric liquid crystal material. There are electrically conductive layers between which the liquid crystal layer is disposed. There is a front writing surface layer that is transparent and a back support layer between which the electrically conductive layers and the liquid crystal layer are disposed. The cholesteric liquid crystal material changes in texture by application of pressure to the front writing surface layer to create an image. A seal confines the cholesteric liquid crystal material between the front writing surface layer and the back support layer. The electrically conductive layers are adapted to enable a voltage waveform to be applied thereto that erases the image. In one aspect, the resilience to bending the writing device is defined by enabling the writing device to be bent to a radius of curvature of 100.0 millimeters for 10 repetitions of the bending and after each of the repetitions of the bending the voltage waveform completely erases the image. In another aspect, the back support layer comprises a first sublayer formed of a flexible polymeric material adjacent to the back electrically conductive lay…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.