System and method for producing custom fitted face masks and applications thereof
US11887320B1 · kind B1 · utility
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1References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2021 |
| Grant date | Jan 30, 2024 |
| Priority date | — |
| Expiry date | Jan 15, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2219/2004
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present invention is generally directed to systems and methods for preparing and producing a custom-fitted face mask, including, as non-limiting examples, a CPAP nasal mask and a CPAP full face mask. At least one embodiment of the invention utilizes infrared (IR) lasers, such as, for example, those found on smartphone cameras, in order to generate a 3D point cloud model of an individual's face. This point cloud model is then used to produce a custom face mask cushion, which is used to customize a generic face mask to conform to the user's specific facial geometry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.