Ultraviolet light generation target, method for manufacturing ultraviolet light generation target, and electron-beam-excited ultraviolet light source
US11887837B2 · kind B2 · utility
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Key dates
| Filing date | Dec 13, 2019 |
| Grant date | Jan 30, 2024 |
| Priority date | — |
| Expiry date | Feb 9, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J63/04
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ultraviolet light generation target includes a light emitting layer. The light emitting layer contains a YPO4 crystal to which at least scandium (Sc) is added, and receives an electron beam to generate ultraviolet light. Further, a method of manufacturing the ultraviolet light generation target includes a first step of preparing a mixture containing yttrium (Y) oxide, Sc oxide, phosphoric acid, and a liquid, a second step of evaporating the liquid, and a third step of firing the mixture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.