Patent · US Active

Vacuum arrangement and method

US11887867B2 · kind B2 · utility

0Cited by

6References

18Claims

0Family size

Assignee

VON ARDENNE Asset GmbH & Co KG · DE

Inventors

Torsten Dsaak · Dresden, DE
Thomas Meyer · Dresden, DE
Bernd Teichert · Dresden, DE
Ralf Biedermann · Dresden, DE

Key dates

Filing date	Jun 26, 2019
Grant date	Jan 30, 2024
Priority date	—
Expiry date	Feb 16, 2042

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67173
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

According to various embodiments, a vacuum arrangement may comprise the following: a first dehydration chamber and a second dehydration chamber, which are gas-separated from one another; a substrate transfer chamber for changing clocked substrate transport into continuous substrate transport towards the second dehydration chamber; a first high-vacuum pump of gas-transfer type for evacuating the first dehydration chamber; and a second high-vacuum pump of gas-binding type for evacuating the second dehydration chamber; wherein the first dehydration chamber is, with respect to the substrate transport, arranged between the second dehydration chamber and the substrate transfer chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.